RIE

An RIE is a type of plasma source in which the energy is supplied by electrical currents produced by electromagnetic induction; that is, by time-varying magnetic fields. In its simplest form, an inductively coupled plasma consists of avacuum vessel, into which the gas to be ionized is administered, and an induction coil,driven by a source of RF power. The coil is generally separated from the vacuum regionby a dielectric window. The wide range of applications for RF-driven, inductively coupled plasma sources has recently expanded into processing tools for coating or etching systems in the microelectronics industry.