MOKE Systems

UHV system for the in-situ real time magneto-optical Kerr effect studies of ultra-thin magnetic films and multilayers with film deposition by e-beam evaporation.

• Base pressure range 10-10 mbar after bakeout at 150 °C
• Magnetic poles arranged perpendicularly to the sample
• Field beetwen magnetic poles > 0,17 Tesla
• 4-axes UHV sample manipulator for flag sample holders
• Sample heating up to 800 °C & cooling with LN2
• Optical system for MOKE chamber (modulator, polaryzers, photodetector, laser)
• Whole chamber with equipment is mounted on the positioning stage
• Vacuum suitcase for sample easy transport