Nano Imprint Kit
EZImprinting’s equipment consists of a nanoimprint module and a controller module. By simply retrofitting your conventional optical mask aligner, our solution can upgrade any facility’s traditional photolithography capacity. EZImprinting provides semiautomatic nanoimprinting with precision nanoscale alignment capabilities. Simple, straight-forward steps direct users through the entire imprint procedure.

• Substrate size： 4 inch
• Imprintable wafer area： 4 inch Maximum
• Mold substrate size： 5 x 0.09 inch
• Typical imprint throughput ：< 5 min./wafer
• Imprint pressure：0 - 25 PSI