Nano Imprint Kit
EZImprinting’s equipment consists of a nanoimprint module and a controller module. By simply retrofitting your conventional optical mask aligner, our solution can upgrade any facility’s traditional photolithography capacity. EZImprinting provides semiautomatic nanoimprinting with precision nanoscale alignment capabilities. Simple, straight-forward steps direct users through the entire imprint procedure.

• Substrate size: PL 200 : 2 inch, PL 400 : 4 inch, PL 600 : 6 inch (smaller sizes, irregular shapes compatible)
• Imprint area: Same as wafer size
• Mold plate size: PL 200 : 2, 1 inch, PL 400 : 4, 3, 1 inch, PL 600 : 6, 4, 2, 1 inch
• Imprint pressure: 1 psi standard
• Mold/substrate Auto release: Included- no special tools needed
• UV exposure time: 2 ~3 min at 95 % intensity level
• Alignment capability: X, Y, Z and theta (accuracy 2 μm)